Guarantees for excellent process results
With these RF generators you can rest assured the TruPlasma RF Series 3000 stands out for its robust design and high efficiency. This means it is best suited for stable reproducible plasma processes, such as those used during the production of semi-conductors, photovoltaic cells, or flat screens. Installed in thousands of applications around the world, these generators guarantee a high level of productivity and excellent process results.
Etching and coating processes
TruPlasma RF Series 3000 radio frequency generators are particularly well-suited for etching and coating processes, such as plasma etching, reactive ion etching, ALD and PECVD.
Coating of metal workpieces
Plasma processes can be used to both apply and remove material to and from surfaces; for example, applying a wear-protection coating to metal workpieces, or structuring electronic components using plasma etching or photo lacquer plasma incineration.
Coating of flat screens and photovoltaic cells
TruPlasma RF Series 3000 RF generators are perfectly suited for plasma processes such as reactive-ion etching (RIE), atomic layer deposition (ALD), plasma-enhanced chemical vapor deposition (PECVD), and RF sputtering. These processes are used for the coating of flat screens and photovoltaic cells, amongst others.
Highest efficiency and process stability
As a result of its excellent efficiency, this generator boasts half of the power loss and a reduction in required cooling water, enabling you to minimize your operating costs. The extremely robust generator design enables longer operating times, even for critical processes, and thus higher coating rates. Plasma fluctuations are effectively prevented as a result of CombineLine technology with true 50 ohm output impedance – ensuring absolutely stable processes.
Safety under all circumstances
The robust design ensures the maximum reliability and productivity of your processes. 100% mismatch protection guarantees secure operation, even during critical loads. Optional continuous or pulsed power output supports a broad array of process requirements. More than 20,000 units are already installed around the world – more than any other plasma power supply.
SystemPort enables closed loop control through the measurement of the RF signal directly at the input and output of the matchbox. All measured values are available to the RF generator. This means all the process parameters can be better monitored, the matchbox protected, and early arc detection guaranteed. The entire RF system can therefore be controlled via a single generator interface.
Various options allow optimal adjustment of the RF generator to your application.
The well-grounded arc management is the ideal module for optimized plasma process control. Targeted arc detection guarantees the highest productivity possible, while protecting the product and the system at the same time.
The user-friendly TruControl Power, control software, enables the convenient start-up and secure monitoring of the RF generator or the entire TRUMPF RF system during current processes.
All components of the TRUMPF RF System are perfectly matched.
Perfectly matched: generator and matchbox
Plasma processes behave like a complex, variable load, to which the power supply from the generator needs to be continually adjusted. Active matchboxes handle this task, ensuring precise adjustment to the optimal impedance of 50 ohms at all times. The result is a perfectly matched system solution, the TRUMPF RF System. The generator and matchbox can be easily integrated into your existing process environment via various interfaces, including EtherCAT. You can also gain an optimized system solution through an intelligent generator/matchbox connection, the so-called SystemPort.
This product range and information may vary depending on the country. Subject to changes to technology, equipment, price, and range of accessories. Please get in touch with your local contact person to find out whether the product is available in your country.